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    Details
    Author(s)
    Affiliation
    Affiliation
    STMicroelectronics/ Université Grenoble Alpes, Grenoble INP, RFIC-Lab
    Affiliation
    Affiliation
    STMicroelectronics, Université Grenoble Alpes, CNRS, Grenoble INP, TIMA Lab
    Display Name
    Patrick Scheer
    Affiliation
    Affiliation
    STMicroelectronics
    Display Name
    Philippe Cathelin
    Affiliation
    Affiliation
    STMicroelectronics
    Affiliation
    Affiliation
    Université Grenoble Alpes, CNRS, Grenoble INP, TIMA Lab
    Display Name
    Manuel Barragan
    Affiliation
    Affiliation
    TIMA Laboratory, CNRS, Grenoble INP, Université Grenoble Alpes, 38000 Grenoble
    Display Name
    Andreia Cathelin
    Affiliation
    Affiliation
    STMicroelectronics
    Display Name
    Bourdel Sylvain
    Affiliation
    Affiliation
    Grenoble INP
    Abstract

    This paper presents a simple and efficient methodology for LNA design which uses the inversion level of the transistor as a design parameter in order to optimize the energy efficiency. The method uses a simple but accurate 7 parameter-based model valid in all regions of operation and allows an accurate preliminary sizing based on an analytical study. The proposed model describes the main short-channel effects in advanced technologies and allows an analytical evaluation of the LNA nonlinearity. A use case using a 28 nm FD-SOI technology is proposed to reflect that the methodology is well suited for designs at weak to moderate inversion level in an advanced technology for which simulation-based studies are often used for early sizing.