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Video s3
    Details
    Presenter(s)
    Mohamed Khalil Bouchoucha Headshot
    Affiliation
    Affiliation
    STMicroelectronics/ Université Grenoble Alpes, Grenoble INP, RFIC-Lab
    Country
    Country
    France
    Author(s)
    Display Name
    Sylvain Bourdel
    Affiliation
    Affiliation
    RFIC Lab
    Display Name
    Serge Subias
    Affiliation
    Affiliation
    Université Grenoble Alpes, Grenoble INP, RFIC-Lab, 38000 Grenoble
    Affiliation
    Affiliation
    STMicroelectronics/ Université Grenoble Alpes, Grenoble INP, RFIC-Lab
    Display Name
    Manuel Barragan
    Affiliation
    Affiliation
    TIMA Laboratory, CNRS, Grenoble INP, Université Grenoble Alpes, 38000 Grenoble
    Display Name
    Andreia Cathelin
    Affiliation
    Affiliation
    STMicroelectronics
    Affiliation
    Affiliation
    Universidade Federal de Santa Catarina
    Abstract

    This paper presents a simple and efficient methodology for Resistive Feedback LNAs (RF-LNAs) design which uses the inversion level of the transistor as a design parameter in order to optimize the energy efficiency. The method uses a simple 4 parameter-based model valid in all regions of operation and allows a preliminary sizing based on an analytical study. A practical design in a 28 nm FD-SOI technology shows that this methodology is well suited for design at low to moderate inversion level in an advanced technology for which simulation based studies are often used by designer as early sizing stage. The designed LNA consumes 0.57 mW and achieves an 18.4 dB gain with 3.3 dB of NF.

    Slides
    • A gm/ID Design Methodology for 28 nm FD-SOI CMOS Resistive Feedback LNAs (application/pdf)