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Video s3
    Details
    Presenter(s)
    Sanjib Basu Headshot
    Display Name
    Sanjib Basu
    Affiliation
    Affiliation
    Intel Technology India Pvt. Ltd.
    Country
    Country
    India
    Author(s)
    Display Name
    Sanjib Basu
    Affiliation
    Affiliation
    Intel Technology India Pvt. Ltd.
    Display Name
    Dror Lazar
    Affiliation
    Affiliation
    Intel Israel Design Center
    Display Name
    Rupesh Pothineni
    Affiliation
    Affiliation
    Intel Technology India Pvt. Ltd.
    Abstract

    This paper presents the key design techniques used in a high-speed PHY in a 3D stacking SOC using FOVEROS Through Silicon Via (TSV). This IO PHY is placed in the base die of the SOC, it needed to accommodate TSV inside the PHY to connect to the package, and it also needed to support uBump connectivity for its signal and power to support wafer level SORT testing. PHY also needed to accommodate Power/Ground TSV and uBump of the top die power delivery. The di/dt noise of the top die power/ground though this PHY posed jitter coupling issue to this PHY PLL inductor. The paper discusses how effectively TSV and uBump patterns are defined inside PHY and other layout considerations are taken care to minimize the performance impact to PHY and minimize coupling to PLL inductor from top die power di/dt and meet jitter spec.

    Slides
    • Design Techniques of High Speed PHY Using Highly Compact FOVEROS Through Silicon Via (application/pdf)