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Video s3
    Details
    Poster
    Presenter(s)
    Alfio Di Mauro Headshot
    Display Name
    Alfio Di Mauro
    Affiliation
    Affiliation
    ETH Zürich
    Country
    Abstract

    In this demo, we show how the effect of process variations can be statically mitigated on a chip fabricated in 22nmFDX technology, thanks to the application of a Body-Biasing (BB) voltage, which is capable to trim the performance of the circuit.