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Video s3
    Details
    Poster
    Presenter(s)
    Minghao Li Headshot
    Display Name
    Minghao Li
    Affiliation
    Affiliation
    University College London
    Country
    Author(s)
    Display Name
    Minghao Li
    Affiliation
    Affiliation
    University College London
    Affiliation
    Affiliation
    University College London
    Affiliation
    Affiliation
    King's College London
    Affiliation
    Affiliation
    University College London
    Abstract

    This paper presents the design of an integrated circuit for (i) galvanostatic deposition of sensor layers on the on-chip pads, and (ii) amperometric readout of electrochemical sensors. The pA-size current generator has a temperature coefficient of 517.8 ppm/°C on average in the range of 0 to 60°C and line regulation of 4.4 %/V over a supply voltage range of 0.8-3 V. The feasibility of galvanostatic deposition on on-chip pads is validated by applying a fixed current to electrochemically deposit a gold layer, which was confirmed using optical microscope images of the on-chip electrodes.

    Slides
    • An Integrated Circuit for Galvanostatic Electrodeposition of on-Chip Electrochemical Sensors (application/pdf)